Work

CMOSFET characteristics induced by moisture diffusion from inter-layer dielectric in 0.23 um DRAM technology with shallow trench isolation

Year: 2002

Type: conference-paper

Source: IEEE International Reliability Physics Symposium proceedings

DOI: 10.1109/relphy.2000.843908

Authors: Sung-Kye Park, Moon-Sik Suh, Jae-Young Kim, Gyu-Han Yoon, Sung-Ho Jang

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1935637134

FWCI: 1.067

Cites: 2

Cited by: 7

Related to: 10