Work

Comparison of VHF, RF and Dc Plasma Excitation for a-Si:H Deposition with Hydrogen Dilution

Year: 1998

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-507-565

Authors: R. Platz, C. Hof, S. Wieder, B. Rech, D. Fischer, A. Shah, A. Payne, S. Wagner

Institutions: Princeton University, University of Neuchâtel, Forschungszentrum Jülich

Language: English

Topic: Silicon and Solar Cell Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W1963929329

FWCI: 0.946

Cites: 9

Cited by: 9

Related to: 10