Work

Microtags with 150-nm line gratings fabricated by use of extreme-ultraviolet lithography

Year: 1998

Type: article

Source: Optics Letters

DOI: 10.1364/ol.23.000013

Authors: M. R. Descour, D. I. Simon, W. C. Sweatt, M. E. Warren, S. H. Kravitz, K. D. Krenz, A. K. Ray-Chaudhuri, R. H. Stulen

Institutions: University of Arizona, Sandia National Laboratories, Sandia National Laboratories California

Language: English

Topic: Advanced Optical Imaging Technologies

Subfield: Media Technology

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1966896255

FWCI: 5.408

Cites: 5

Cited by: 4

Related to: 10