Molecular dynamics simulation of microcrystalline Si deposition processes by silane plasmas
Year: 2007
Type: article
Source: Thin Solid Films
Authors: Masaaki Matsukuma, Satoshi Hamaguchi
Institution: The University of Osaka
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1968392013