Work

Improvement of KrF contact layer by inverse lithography technology with assist feature

Year: 2010

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.868563

Authors: Sungho Jun, Yeon-Ah Shim, Jaeyoung Choi, Kwangsun Choi, Jae-won Han, Kechang Wang, John McCarthy, Guangming Xiao, Grace Dai, DongHwan Son, Xin Zhou, Tom Cecil, David Kim, KiHo Baik

Institution: Dongbu HiTek (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W1970324381

FWCI:

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Cited by: 1

Related to: 10