Work

Preparations and properties of novel positive photosensitive polyimides

Year: 1991

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.46392

Authors: Rumiko H. Hayase, Naoko Kihara, Naohiko Oyasato, S. Matake, Masayuki Oba

Institution: Toshiba (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1973195609

FWCI:

Cites:

Cited by: 1

Related to: 10