Growth of SiC Films using Tetraethylsilane
Year: 2004
Type: article
Source: Materials science forum
Authors: N. Kubo, Tadahiro Kawase, S. Asahina, Nobuyuki Kanayama, H. Tsuda, A. Moritani, Koichi Kitahara
Institutions: Shimane University, Sojo University, Suzuki (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1975282018