Work

Reactive ion beam etching of InP with N2 and N2/O2 mixtures

Year: 1986

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.96566

Authors: W. Katzschner, U. Niggebrügge, R. Löffler, H. Schröter-Janssen

Institution: Fraunhofer Institute for Telecommunications, Heinrich Hertz Institute

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1975445102

FWCI: 2.019

Cites: 9

Cited by: 29

Related to: 10