Work

Oxygen diffusion in silicon oxide films produced by different methods

Year: 2000

Type: article

Source: Thin Solid Films

DOI: 10.1016/s0040-6090(00)01568-6

Authors: J.J Pérez-Bueno, R Ramı́rez-Bon, Y.V Vorobiev, F Espinoza-Beltrán, J González-Hernández

Institutions: Autonomous University of Queretaro, Centro de Investigación y de Estudios Avanzados del Instituto Politécnico Nacional

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Consejo Nacional de Ciencia y Tecnología

OpenAlex ID: W1975922467

FWCI: 1.268

Cites: 22

Cited by: 28

Related to: 10