Work

3D mask modeling for EUV lithography

Year: 2012

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.918267

Authors: Julien Mailfert, Christian Zuniga, Vicky Philipsen, Konstantinos Adam, Michael Lam, James Word, Eric Hendrickx, Geert Vandenberghe, Bruce Smith

Institutions: Mentor Graphics (United States), IMEC, Rochester Institute of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1978234343

FWCI: 0.813

Cites: 9

Cited by: 7

Related to: 10