Work

EUV source development at Energetiq

Year: 2008

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.772890

Authors: Paul A. Blackborow, Matthew J. Partlow, Stephen F. Horne, Matthew M. Besen, Donald K. Smith, Deborah S. Gustafson

Institution: Energetiq Technology (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1978327014

FWCI: 2.369

Cites: 13

Cited by: 11

Related to: 10