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Light sources for EUV lithography at the 22-nm node and beyond

Year: 2012

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.916531

Authors: Igor V. Fomenkov, Norbert R. Böwering, David C. Brandt, Daniel J. Brown, Alexander N. Bykanov, Alex I. Ershov, Bruno La Fontaine, Michael J. Lercel, David W. Myers

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Affordable and clean energy

Open Access status: closed

Funder: Cymer

OpenAlex ID: W1978416082

FWCI: 2.031

Cites:

Cited by: 7

Related to: 10