Effect of internal stresses and microstructure of sputtered TiN films on solid-phase reactions with Al-Si-Cu alloy films
Year: 1995
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.360717
Authors: T. Yamauchi, T. Yamaoka, K. Yashiro, S. Sobue
Language: English
Subfield: Mechanics of Materials
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1978483775