The effects of reaction parameters on the deposition characteristics in Al2O3 CVD
Year: 1983
Type: article
DOI: 10.1116/1.572221
Authors: Chul-Soon Park, Jae-Gon Kim, John S. Chun
Institution: Korea Advanced Institute of Science and Technology
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1978979952