Work

Silicon Etching Study in a RT-CVD Reactor with the HCl/H2 Gas Mixture

Year: 2006

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-0910-a24-02

Authors: Nicolas Loubet, Alexandre Talbot, Didier Dutartre

Institution: STMicroelectronics (France)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1980701705

FWCI: 0.328

Cites: 7

Cited by: 4

Related to: 10