Work

Process margin improvement using custom transmission EAPSM reticles

Year: 2007

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.712368

Authors: J. Buntin, S. Agarwal, B. Rolfson, R. Housley, B. Baggenstoss, E. Byers, C. Progler

Institutions: Micron (United States), Photronics (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W1982910906

FWCI:

Cites:

Cited by: 1

Related to: 10