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EUV mask inspection with 193 nm inspector for 32 and 22 nm HP

Year: 2010

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.864093

Authors: Daniel Wack, Qiang Q. Zhang, Gregg Inderhees, Dan Lopez

Institution: KLA (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1982958729

FWCI:

Cites:

Cited by: 7

Related to: 10