Work

Material characteristics and applications of transparent amorphous oxide semiconductors

Year: 2010

Type: article

Source: NPG Asia Materials

DOI: 10.1038/asiamat.2010.5

Authors: Toshio Kamiya, Hideo Hosono

Institutions: Tokyo Institute of Technology, Japan Science and Technology Agency

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W1982968328

FWCI: 24.41

Cites: 60

Cited by: 1,187

Related to: 10