Work

Recent progress in low temperature nanoimprint lithography

Year: 2014

Type: article

Source: Microsystem Technologies

DOI: 10.1007/s00542-014-2366-6

Author: Hongwen Sun

Institution: Hohai University

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1982989788

FWCI: 3.799

Cites: 37

Cited by: 46

Related to: 10