Work

Plasma and injection modification of the gate dielectric in MOS structures

Year: 2003

Type: article

Source: Thin Solid Films

DOI: 10.1016/s0040-6090(02)01146-x

Authors: G.G. Bondarenko, V.V. Andreev, V.M. Maslovsky, A.A. Stolyarov, V.E. Drach

Institutions: Moscow State Institute of Electronics and Mathematics, Bauman Moscow State Technical University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1983403196

FWCI: 0.327

Cites: 7

Cited by: 12

Related to: 10