Ion implantation and thermal annealing of α-Al2O3 single crystals
Year: 1983
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.332076
Institution: Oak Ridge National Laboratory
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1983753501
