Work

Dynamics of a pulsed DC discharge used for plasma-assisted chemical vapor deposition — a case study for titanium nitride deposition

Year: 1999

Type: article

Source: Surface and Coatings Technology

DOI: 10.1016/s0257-8972(99)00486-7

Authors: T.A. Beer, J. Laimer, H. Störi

Institution: TU Wien

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Austrian Science Fund

OpenAlex ID: W1985115267

FWCI: 3.107

Cites: 13

Cited by: 13

Related to: 10