Work

Si/XeF2 etching: Reaction layer dynamics and surface roughening

Year: 1996

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.580200

Authors: M. J. M. Vugts, M. F. A. Eurlings, L. J. F. Hermans, H. C. W. Beijerinck

Institution: Eindhoven University of Technology

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1985348193

FWCI: 1.455

Cites:

Cited by: 38

Related to: 10