Work

Substrate-Independent Dip-Pen Nanolithography Based on Reactive Coatings

Year: 2010

Type: article

Abstract: We report that nanostructuring via dip-pen nanolithography can be used for modification of a broad range of different substrates (polystyrene, Teflon, stainless steel, glass, silicon, rubber, etc.) without the need for reconfiguring the underlying printing technology. This is made possible through the use of vapor-based coatings that can be deposited on these substrates with excellent conformity, while providing functional groups for subsequent spatially directed click chemistry via dip-pen nanolithography. Pattern quality has been compared on six different substrates demonstrating that this approach indeed results in a surface modification protocol with potential use for a wide range of biotechnological applications.

Source: Journal of the American Chemical Society

DOI: 10.1021/ja108679m

Authors: Hsien-Yeh Chen, Michael Hirtz, Xiaopei Deng, Thomas Laue, Harald Fuchs, Joerg Lahann

Institutions: Karlsruhe Institute of Technology, National Taiwan University, University of Münster, CeNTech

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W1986452647

FWCI: 3.382

Cites: 45

Cited by: 72

Related to: 10