Work

I n s i t u x-ray photoelectron spectroscopic study of remote plasma enhanced chemical vapor deposition of silicon nitride on sulfide passivated InP

Year: 1990

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

DOI: 10.1116/1.584977

Authors: W. M. Lau, S. Jin, X.-W. Wu, S. Ingrey

Institution: Western University

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1988186272

FWCI: 2.782

Cites:

Cited by: 46

Related to: 10