HF Etchant Solutions in Supercritical Carbon Dioxide for “Dry” Etch Processing of Microelectronic Devices
Year: 2003
Type: article
Source: Chemistry of Materials
DOI: 10.1021/cm034235w
Authors: Charles A. Jones, Dongxing Yang, Eugene A. Irene, Stephen M. Gross, Mark Wagner, James DeYoung, Joseph M. DeSimone
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Funder: Division of Chemistry
OpenAlex ID: W1989118348