Work

Effect of laser mask repair-induced residue and quartz damage in sub-half-micrometer DUV wafer processes

Year: 1995

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.228166

Authors: Pei-yang Yan, Qi-De Qian, Joan McCall, Joseph C. Langston, Yu S. Ger, Joe S. Cho, Robert F. Hainsey

Institution: Intel (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1989299355

FWCI: 1.291

Cites:

Cited by: 7

Related to: 10