Work

The Performance of Magnetic Tunnel Junction Integrated on the Back-End Metal Line of Complimentary Metal–Oxide–Semiconductor Circuits

Year: 2010

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.1143/jjap.49.04dm06

Authors: Tetsuo Endoh, Fumitaka Iga, Shoji Ikeda, Katsuya Miura, Jun Hayakawa, Masashi Kamiyanagi, Haruhiro Hasegawa, Takahiro Hanyu, Hideo Ohno

Institutions: Tohoku University, Research Institute of Electrical Communication, Tohoku University, Hitachi (Japan)

Language: English

Topic: Magnetic properties of thin films

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funder: McGill University

OpenAlex ID: W1989352007

FWCI:

Cites: 12

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Related to: 10