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Elastic strain in InGaN and AlGaN layers

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Year: 2000
Type: article
Source: Materials Science and Engineering B
DOI: 10.1016/s0921-5107(00)00371-8
Authors: M.F. Wu, Shude Yao, A. Vantomme, S. Hogg, G. Langouche, W. Van der Stricht, K. Jacobs, I. Moerman, J. Li, G.Y. Zhang
Institutions: Peking University, KU Leuven, Ghent University, IMEC
Language: English

Topic: GaN-based semiconductor devices and materials
Subfield: Condensed Matter Physics
Field: Physics and Astronomy
Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Fonds Wetenschappelijk Onderzoek, Vlaamse regering
Award: 沟道离子束合成法实现稀土硅化物的形成及其特性研究
OpenAlex ID: W1989664483
FWCI: 0.541
Cites: 16
Cited by: 13
Related to: 10
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