Dependence of nitriding degree of Ti surface by non-LTE nitrogen plasma on various plasma parameters
Year: 2004
Type: article
Source: Thin Solid Films
Authors: H. Kobori, S. Koike, S. Watanabe, M. Matsuzaki, H. Matsuura, H. Akatsuka
Institution: Tokyo Institute of Technology
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1989986320