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Making high-performance scattering-bar OPC masks with vector-scan, variable-shaped e-beam, and raster-scan laser mask writers

Year: 1998

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.332871

Authors: Hao H. Lu, Raymond Hwang, Vincent Lee, Willy Q, J. Fung Chen, Thomas L. Laidig, Kurt E. Wampler, Roger F. Caldwell

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1991374500

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