Work

Limitation of removal particles in positive photoresist

Year: 1992

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.59772

Authors: Shingo Asaumi, Mitsuhiro Furuta, Akira Yokota

Institution: Tokyo Ohka Kogyo (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1991648464

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Cites:

Cited by: 1

Related to: 10