Work

CVD-SiO2 and plasma-SiNx films as Zn diffusion masks for GaAs

Year: 1984

Type: article

Source: Journal of Electronic Materials

DOI: 10.1007/bf02656678

Authors: C. Blaauw, A. J. SpringThorpe, S. Dzioba, B. Emmerstorfer

Institution: Bell (Canada)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1991694434

FWCI: 3.452

Cites: 20

Cited by: 14

Related to: 10