Work

Focus drilling for increased process latitude in high-NA immersion lithography

Year: 2011

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.882391

Authors: Ivan Lalovic, Jason Lee, Nakgeuon Seong, Nigel Farrar, Michiel Kupers, Hans van der Laan, Tom van der Hoeff, Carsten Kohler

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1991809313

FWCI: 1.273

Cites: 10

Cited by: 6

Related to: 10