Work

Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleation

Year: 1998

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.581144

Authors: L. L. Smith, W. W. Read, C. S. Yang, E. Srinivasan, C. H. Courtney, H. H. Lamb, G. N. Parsons

Institution: North Carolina State University

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1992425004

FWCI: 0.982

Cites: 16

Cited by: 3

Related to: 10