Work

193/157 nm UV coatings for next generation photolithography – All aspects

Year: 2001

Type: conference-paper

Source: Optical Interference Coatings

DOI: 10.1364/oic.2001.thb2

Author: Hans Lauth

Institution: Jenoptik (Germany)

Language: English

Topic: Optical Coatings and Gratings

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1993087201

FWCI:

Cites:

Cited by: 1

Related to: 10