UV enhanced substrate conformal imprint lithography (UV-SCIL) technique for photonic crystals patterning in LED manufacturing
Year: 2009
Type: article
Source: Microelectronic Engineering
Authors: Ran Ji, Michael Hornung, Marc A. Verschuuren, Robert van de Laar, Jan van Eekelen, Ulrich Plachetka, Michael Moeller, Christian Moormann
Institutions: SUSS MicroTec (Germany), AMO (Germany)
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1993262467