Influence of Substrate Temperature on Structural Properties and Deposition Rate of AlN Thin Film Deposited by Reactive Magnetron Sputtering
Year: 2012
Type: article
Source: Journal of Electronic Materials
Language: English
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Award: G2248076206
OpenAlex ID: W1993281237
