Work

Kinetically Assisted Potential Sputtering of Insulators by Highly Charged Ions

Year: 2001

Type: article

Abstract: A new form of potential sputtering has been found for impact of slow ( < or = 1500 eV) multiply charged Xe ions (charge states up to q = 25) on MgO(x). In contrast to alkali-halide or SiO2 surfaces this mechanism requires the simultaneous presence of electronic excitation of the target material and of a kinetically formed collision cascade within the target in order to initiate the sputtering process. This kinetically assisted potential sputtering mechanism has been identified to be present for other insulating surfaces as well.

Source: Physical Review Letters

DOI: 10.1103/physrevlett.86.3530

Authors: G. Hayderer, S. Cernusca, M. Schmid, P. Varga, HP. Winter, F. Aumayr, D. Niemann, V. Hoffmann, N. Stolterfoht, C. Lemell, L. Wirtz, J. Burgdörfer

Institution: TU Wien

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Computational Mechanics

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W1993669959

FWCI: 6.491

Cites: 23

Cited by: 73

Related to: 10