Work

Faster sensitivity and non-antimonite permanent photoresist for MEMS

Year: 2006

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.656249

Authors: Koichi Misumi, Koji Saito, Atsushi Yamanouchi, Takahiro Senzaki, Toshiki Okui, Hideo Honma

Institutions: Tokyo Ohka Kogyo (Japan), Kanto Gakuin University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1993713632

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