Work

A Study of the Influence of Typical Wet Chemical Treatments on the Germanium Wafer Surface

Year: 2005

Type: article

Source: Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

DOI: 10.4028/www.scientific.net/ssp.103-104.27

Authors: Bart Onsia, Thierry Conard, Stefan De Gendt, Marc M. Heyns, I. Hoflijk, Paul W. Mertens, Marc Meuris, G. Raskin, Sonja Sioncke, I. Teerlinck, Antoon Theuwis, Jan Van Steenbergen, Chris Vinckier

Institutions: IMEC, Umicore (Belgium), Umicore (United States), Umicore (Germany), KU Leuven

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1994002182

FWCI: 3.996

Cites: 1

Cited by: 91

Related to: 10