Work

Growth of Si on Si(111) × -In surfaces studied by UHV-REM

Year: 1993

Type: article

Source: Surface Science

DOI: 10.1016/0039-6028(93)91099-b

Authors: Hiroki Minoda, Yasumasa Tanishiro, Naoki Yamamoto, Katsumichi Yagi

Institution: Tokyo Institute of Technology

Language: English

Topic: Surface and Thin Film Phenomena

Subfield: Condensed Matter Physics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1994141237

FWCI: 2.453

Cites: 7

Cited by: 21

Related to: 10