Work

Long-Range Diffusion of Transition Metals in Silicon During Rapid Thermal Annealing

Year: 1989

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-146-385

Authors: D.R. Sparks, N.S. Alvi, K. Sanders

Institution: Purdue University West Lafayette

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1994765495

FWCI: 0.852

Cites: 12

Cited by: 4

Related to: 10