A resurfed high-voltage NMOS device fully compatible with a low-voltage 0.8 μm BiCMOS technology
Year: 1996
Type: article
Source: Solid-State Electronics
Institutions: University of Toronto, Nortel (Canada)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1994799722
