Work

Positive chemically amplified resists using naphthoquinone diazides as photo-acid-generators.

Year: 1993

Type: article

Source: Journal of Photopolymer Science and Technology

DOI: 10.2494/photopolymer.6.495

Authors: Rumiko Hayase, Yasunobu Onishi, Hirokazu Niki, Naohiko Oyasato, Shuzi Hayase

Institution: Toshiba (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: diamond

OpenAlex ID: W1994865256

FWCI:

Cites: 1

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Related to: 10