Work

A UHV compatible and miniaturized evaporator used as a controlled source of high melting point metal vapor

Year: 1984

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.572480

Authors: B. Bellamy, C. Colomer

Institutions: Centre National de la Recherche Scientifique, Chimie ParisTech - PSL

Language: English

Topic: Advanced Materials and Semiconductor Technologies

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1994973409

FWCI: 1.423

Cites:

Cited by: 11

Related to: 10