Work

Effect of ion-beam treatment during reactive high-frequency magnetron sputtering on macrostresses in ITO films

Year: 2014

Type: article

Source: Semiconductors

DOI: 10.1134/s1063782614060177

Authors: P. N. Krylov, R. M. Zakirova, I. V. Fedotova

Institution: Udmurt State University

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1995186346

FWCI:

Cites: 18

Cited by: 1

Related to: 10