Work

Al2O3 and TiO2 Atomic Layer Deposition on Copper for Water Corrosion Resistance

Year: 2011

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/am2009579

Authors: A. I. Abdulagatov, Y. Yan, J. R. Cooper, Y. Zhang, Z. M. Gibbs, A. S. Cavanagh, R. G. Yang, Y. C. Lee, S. M. George

Institutions: Defense Advanced Research Projects Agency, University of Colorado Boulder

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Clean water and sanitation

Open Access status: closed

Funders: National Science Foundation, University of Minnesota, Defense Advanced Research Projects Agency

OpenAlex ID: W1995326391

FWCI: 10.19

Cites: 53

Cited by: 306

Related to: 10