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Neural Network Based Run-to-Run Process Controller for Copper Chemical Mechanical Polishing

Year: 2004

Type: conference-paper

Source: ASME International Mechanical Engineering Congress and Exposition (IMECE)

DOI: 10.1115/imece2004-59546

Authors: Gou-Jen Wang, Bor-Shin Lin, Kang J. Chang

Institutions: National Chung Hsing University, California State University, Northridge

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Industrial and Manufacturing Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1995457032

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