Work

Nanoimprint lithography stamp modification utilizing focused ion beams

Year: 2009

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.3265461

Authors: Heinz D. Wanzenboeck, Simon Waid, Emmerich Bertagnolli, Michael Muehlberger, Iris Bergmair, Rainer Schoeftner

Institutions: TU Wien, PROFACTOR GmbH (Austria)

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W1995877783

FWCI: 0.657

Cites: 18

Cited by: 15

Related to: 10